3

Developer Characteristics of Poly-(Methyl Methacrylate) Electron Resist

Year:
1975
Language:
english
File:
PDF, 648 KB
english, 1975
4

Time evolution of developed contours in poly-(methyl methacrylate) electron resist

Year:
1974
Language:
english
File:
PDF, 676 KB
english, 1974
5

Efficient continuum sources for x-ray lithography

Year:
1975
Language:
english
File:
PDF, 487 KB
english, 1975
6

Solubility Rate of Poly-(Methyl Methacrylate), PMMA, Electron-Resist

Year:
1974
Language:
english
File:
PDF, 277 KB
english, 1974